Product · Airborne Molecular Contamination
Ultra-sensitive airborne molecular contamination detection for semiconductor cleanroom environments—protecting billion-dollar manufacturing processes with sub-ppt sensitivity.
High sensitivity detection for molecular contamination that can impact semiconductor manufacturing processes.
Ultra-sensitive detection capabilities for semiconductor cleanroom environments where even trace molecular contamination can destroy entire wafer batches.
The IUT AMC Monitoring System provides the ultra-sensitive detection capabilities required to protect semiconductor manufacturing from airborne molecular contamination. With detection limits in the low ppt range and real-time monitoring capability, this system ensures the pristine environment necessary for advanced chip production.
In today's semiconductor fabs producing 5nm and smaller nodes, even trace molecular contamination can destroy entire wafer batches worth millions of dollars. Our AMC system provides the early warning needed to prevent contamination events and maintain the quality standards demanded by the industry.
Comprehensive detection of molecular contaminants that threaten semiconductor manufacturing processes and device reliability.
Corrosive compounds that attack metal interconnects and cause device failures.
| Contaminant | Detection Limit |
|---|---|
| Hydrogen Fluoride (HF) | < 0.1 ppb |
| Hydrogen Chloride (HCl) | < 0.5 ppb |
| Sulfuric Acid (H₂SO₄) | < 0.2 ppb |
| Nitric Acid (HNO₃) | < 0.3 ppb |
| Acetic Acid | < 1.0 ppb |
Alkaline compounds that neutralize dopants and alter electrical characteristics.
| Contaminant | Detection Limit |
|---|---|
| Ammonia (NH₃) | < 0.1 ppb |
| Trimethylamine | < 0.05 ppb |
| Diethylamine | < 0.1 ppb |
| Morpholine | < 0.2 ppb |
| Cyclohexylamine | < 0.3 ppb |
Carbon-based compounds that interfere with photolithography and etching processes.
| Contaminant | Detection Limit |
|---|---|
| Toluene | < 0.1 ppb |
| Xylenes | < 0.2 ppb |
| Acetone | < 0.5 ppb |
| Isopropanol (IPA) | < 1.0 ppb |
| Methanol | < 0.8 ppb |
Semiconductor dopant gases that cause cross-contamination between process areas.
| Contaminant | Detection Limit |
|---|---|
| Arsine (AsH₃) | < 0.01 ppb |
| Phosphine (PH₃) | < 0.01 ppb |
| Silane (SiH₄) | < 0.1 ppb |
| Germane (GeH₄) | < 0.02 ppb |
State-of-the-art analytical methods optimized for cleanroom environments and semiconductor manufacturing requirements.
Ultra-high sensitivity IMS technology optimized for trace-level AMC detection in cleanroom environments.
Comprehensive sampling system providing complete facility coverage with centralized analysis.
Comprehensive monitoring solutions for every critical area of semiconductor fabrication facilities and cleanroom operations.
Advanced analytics and seamless integration with manufacturing execution systems for complete facility oversight.
In advanced semiconductor manufacturing, invisible molecular contamination can destroy yield and cost millions in lost production. Our AMC Monitoring System provides the ultra-sensitive detection capabilities needed to protect your cleanroom environment and ensure consistent, high-quality production.
ppb-range sensitivity · 61 sampling points · Real-time monitoring · Comprehensive coverage