Cleanroom AMC · Semiconductor

Airborne Molecular Contamination (AMC) Monitoring

Comprehensive real-time monitoring of acids, bases, and organics for semiconductor cleanrooms and precision manufacturing environments.

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< 0.1 ppb Detection Limit
From 30s Response Time
61 Points Multi-Point Sampling
20+ Years Experience

Critical AMC Control for Semiconductor Manufacturing

Airborne molecular contamination (AMC) poses a significant threat to semiconductor manufacturing yields and product quality. Even trace levels of acids, bases, and organic compounds can cause device failures, reduced performance, and costly production delays.

Why AMC Monitoring is Essential

  • Yield Protection: Prevent contamination-related defects that can reduce manufacturing yields by up to 30%
  • Quality Assurance: Ensure consistent product performance and reliability
  • Process Control: Maintain optimal manufacturing conditions throughout production
  • Regulatory Compliance: Meet SEMI and international cleanroom standards
  • Cost Reduction: Minimize scrap, rework, and equipment downtime

Key Applications

  • Semiconductor fabrication
  • LCD/OLED manufacturing
  • Precision optics production
  • Hard disk drive manufacturing
  • Pharmaceutical cleanrooms
  • Aerospace component production
  • MEMS device fabrication
  • Solar cell manufacturing

Monitored Compounds & Detection Limits

Comprehensive detection of all critical AMC categories with sub-ppb sensitivity for maximum contamination control.

🔴 Acids

Critical acid contamination monitoring for metal corrosion prevention and device integrity.

Compound Impact
H₂SO₄ (Sulfuric Acid) Contact degradation
HCl (Hydrogen Chloride) Metal corrosion
HF (Hydrogen Fluoride) Silicon etching
HNO₃ (Nitric Acid) Oxide growth
Organic Acids Photoresist issues

🟢 Bases

Alkaline compound detection for process chemistry control and equipment protection.

Compound Impact
Butylamine Process contamination
Cyclohexylamine Dopant interference
Dimethylamine Dopant activation
Ethanolamine Surface contamination
HMDS (Hexamethyldisilazane) Silicon deposition
Isopropylamine Process chemistry
Methylamine Metal contamination
NH₃ (Ammonia) Gate oxide damage
Triethylamine Resist interference
Trimethylamine Junction damage

🔵 Organics

Volatile organic compounds that can affect photoresist performance and device characteristics.

Compound Source
Acetone Cleaning solvents
DBP (Dibutylphthalat) Outgassing from materials
Ethyl lactate Green solvents
Isopropanol Wafer cleaning
NMP (N-Methyl-2-pyrrolidon) Coating processes
PGME Resist systems
PGMEA Resist thinners
Toluene Photoresist solvents
Xylene Coating processes

AMC Monitoring System Features

Advanced monitoring capabilities designed for the most demanding cleanroom environments.

⚡ Real-Time Monitoring

  • Continuous Operation: Continuous monitoring with no interruption
  • Fast Response: Detection within seconds of contamination events
  • Multi-Point Sampling: Monitor up to 61 locations simultaneously
  • Automatic Calibration: With appropriate calibrator equipment
  • Real-time Alarms: Immediate notification of contamination events
Detection Range 0.1 ppb to 1000 ppm
Response Time From 30 seconds
Accuracy ±2% Full Scale

💾 Data Management & Integration

  • Historical Trending: Long-term data storage and analysis
  • Alarm Management: Configurable alert thresholds and notifications
  • Reporting Tools: Automated compliance and trend reports
  • Web Interface: Remote monitoring and control capabilities
Interfaces Ethernet TCP/IP, RS-485
Outputs 4-20 mA, Digital I/O
Data Storage 1+ year local storage
Protocols Modbus, OPC

Protect Your Manufacturing Investment

Don't let airborne molecular contamination compromise your manufacturing yields and product quality. Our AMC monitoring solutions provide the real-time visibility and control you need to maintain optimal cleanroom conditions.

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Sub-ppb Detection · Real-time Monitoring · Global Support · 20+ Years Experience