Technology · AMC Monitoring · Cleanroom
Advanced Ion Mobility Spectrometry and Gas Chromatography solutions for comprehensive airborne molecular contamination detection in semiconductor and precision manufacturing environments.
Airborne Molecular Contamination poses critical threats to high-technology manufacturing processes, especially in semiconductor production.
AMC contaminations encompass various molecular groups with different damage mechanisms. These airborne contaminants cause expensive, yield-reducing problems that can impact entire manufacturing processes.
Contaminations as chemical films or layers, sometimes as thin as a single molecule, can alter electrical, optical, and physical properties of product surfaces.
Ion Mobility Spectrometry provides superior sensitivity, selectivity, and speed for comprehensive AMC monitoring.
Comprehensive detection capabilities across all critical AMC categories with specified detection limits for each compound class.
Detection Range: < 0.1 ppb (0-50 ppb)
| Compound | Formula | CAS # |
|---|---|---|
| Sulphur Dioxide | SO₂ | 7446-09-5 |
| Hydrogen Chloride | HCl | 7647-01-0 |
| Hydrogen Fluoride | HF | 7664-39-3 |
| Nitrogen Oxide | NO₂ | 10102-44-0 |
| Bromine | Br₂ | 7726-95-6 |
| Chlorine | Cl₂ | 7782-50-5 |
Detection Range: < 0.1 ppb (0-100 ppb)
| Compound | Formula | CAS # |
|---|---|---|
| Dimethylamine | C₂H₇N | 124-40-3 |
| Butylamine | C₄H₁₁N | 109-73-9 |
| Triethylamine | C₆H₁₅N | 121-44-8 |
Detection Range: < 0.1 ppb (0-50 ppb)
| Compound | Formula | CAS # |
|---|---|---|
| NMP | C₅H₉NO | 872-50-4 |
| Acetone | C₃H₆O | 67-64-1 |
| Isopropylalcohol | C₃H₈O | 67-63-0 |
| PGME | C₄H₁₀O₂ | 1320-67-8 |
| PGMEA | C₆H₁₂O₃ | 108-65-6 |
| Ethyllactate | C₅H₁₀O₃ | 97-64-3 |
| HMDS | C₆H₁₉NSi₂ | 999-97-3 |
Detection Range: < 1.0-1.5 ppb (0-500 ppb)
| Compound | Formula | Detection Limit |
|---|---|---|
| Arsine | AsH₃ | < 1.0 ppb |
| Phosphine | PH₃ | < 1.0 ppb |
| Boron Trichloride | BCl₃ | 1.5 ppb |
Detection Range: < 0.1 ppb (0-100 ppb)
| Compound | Formula | CAS # | Applications |
|---|---|---|---|
| Ammonia | NH₃ | 7664-41-7 | Semiconductor processing, cleanroom monitoring |
Multiple analyzer configurations available from portable units to comprehensive multi-analyzer systems.
Compact analyzer suitable for single-point monitoring and portable applications.
Comprehensive 42 HU rack system combining GC-IMS, GC-PID and supplementary devices.
Comprehensive technical performance data for AMC monitoring systems.
| Principle | IMS with GC pre-separation, no carrier gas |
| Resolution | ±2% Full Scale |
| Detection Limits | < 0.1 ppb (compound dependent) |
| Measurement Range | ppb to ppm range |
| Cycle Time | Minutes (depending on GC setup) |
| Repeatability | Outstanding within cycle times |
| Operating Temperature | -10°C to +50°C (depending on housing) |
| Sample Flow | 250-300 ml/min atmospheric pressure |
| Sample Exhaust | ± 3.5 kPa (0.5 psi) max at atmospheric |
| Power Supply | 230(115) VAC; 50(60) Hz |
| Outputs | Displays, RS 232/485, LAN/W-LAN, Digital I/O |
Custom-configured systems for diverse high-technology manufacturing environments.
Advanced IMS technology advantages for comprehensive AMC monitoring solutions.
Protect your high-value manufacturing processes with proven IMS technology for comprehensive airborne molecular contamination detection. Our systems deliver the sensitivity and reliability needed for critical cleanroom environments.
< 0.1 ppb detection limits · 25+ compound detection · Custom configurations · Technical support